A joint Chinese-US research team says it has developed a new semiconductor manufacturing method that it says could “open up entirely new avenues” to develop high-performance light-emitting and integrated devices.
The process would surpass conventional lithography machines, which are the main way today of making the semiconductors used in most electronics.
When a lithography machine etches a chip circuit, the laser strikes the material vertically. If light goes sideways, it causes uncontrolled…
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